Industrial Plasma Engineering: Volume 1: PrinciplesThis book will provide the necessary theoretical background and a description of plasma-related devices and processes that are used industrially for physicists and engineers. It is a self-contained introduction to the principles of plasma engineering with comprehensive references. This volume also includes the terminology, jargon and acronyms used in the field of industrial plasma engineering - indexed when they first appear in the text - along with their definitions and a discussion of their meaning. It is aimed at assisting the student in learning key terminology and concepts, and providing the in-service engineer or scientist with a technical glossary. An extensive index and appendices enhance the value of this book as a key reference source. These incorporate a list of the nomenclature used in mathematical expressions in the text, physical constants, and often-used plasma formulae. SI units are used throughout. Intended for students from all engineering and physical science disciplines, and as a reference source by in-service engineers. Coverage: * basic information on plasma physics and the physical processes important in industrial plasmas * sources of ion and electron beams and ionizing radiation used in industrial applications * physics and technology of DC and RF electrical discharges. |
Contents
Introduction | 1 |
Plasma Treatment of Surfaces | 2 |
Ion Interactions with Solids | 15 |
Plasma Deposition of Thin Films | 16 |
Plasma Etching for Microelectronics 18 Materials Processing with Thermal Plasma | 17 |
Plasma Chemistry | 19 |
Electrical Breakdown Switchgear and Corona | 20 |
Plasma Lighting Devices | 21 |
Characteristics of Plasma | 117 |
Electron Sources and Beams | 159 |
Ion Sources and Beams | 189 |
Ionizing Radiation Sources | 223 |
Dark Electrical Discharges in Gases | 237 |
viii | 391 |
Capacitive RF Electrical Discharges in Gases | 417 |
Microwave Electrical Discharges in Gases | 464 |
Applications of Electrohydrodynamics | 22 |
Research and Development Plasmas Appendices including Annotated Bibliography | 23 |
Kinetic Theory of Gases | 34 |
Motion of Charges in Electric and Magnetic Fields | 54 |
Appendices | 516 |
B Physical Constants | 523 |
About the Author | 537 |
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Common terms and phrases
accelerated anode approximately axial axis axisymmetric breakdown characteristic charged particles coil collision frequency configuration constant corona current density curve cyclotron cylindrical deflection diode distribution function drift velocity electric field electromagnetic electron collision frequency electron kinetic temperature electron number density electron plasma frequency electronvolts electrostatic energy transfer frequency flux gas flow gases geometry given by equation glow discharge gyrofrequency gyroradius heating high voltage hollow cathode industrial applications interaction ion beam ion source ionization low pressure magnetic field magnetic induction magnetic mirror magnetized plasma mean free path meter microwave negative glow neutral gas normal glow discharge operating parallel plate parameter Penning discharge physics plasma frequency plasma processing plasma reactor plasma sources plasma torch positive column potential radiation radius regime region relativistic RF plasma RF power supply sheath shown in figure skin depth space-charge limited Substituting equation surface thermal arcs Torr unmagnetized V₁ vacuum wall